2012/02/04

Advanced Microwave Plasma Source and EMICON plasma monitoring

An R&D for an advanced microwave plasma source with EMICON spectroscopic plasma monitoring technique assisted was done recently. A laser beam was introduced to assist the alignment of the collimator to obtain correct plasma information. The MW source is a linear type with a short length.  It can be scaled up to 3.2m long in dual magnetrons coupled configuration.



Contributed by: PLASUS  and  IBF Electronic GmbH & Co. KG

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